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Efficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter Films
The formation of a fissured copper surface by picosecond pulsed laser irradiation is combined with functional coatings consisting of Ti and amorphous carbon layers or a Ti–Zr–V compound film to fabricate surfaces with the maximum of the secondary electron yield being as low as 0.4. By structural and...
Autores principales: | , , , , , , , , , , , |
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Lenguaje: | eng |
Publicado: |
2022
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1002/admi.202201671 http://cds.cern.ch/record/2847604 |
_version_ | 1780976804249468928 |
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author | Himmerlich, Marcel Zanin, Danilo A Taborelli, Mauro Granadeiro Costa, Angelo Rafael Costa Pinto, Pedro Lain Amador, Lucia Vollenberg, Wilhelmus Baris, Adrienn Garcia‐Tabares Valdivieso, Elisa Perez Fontenla, Ana Teresa Wackerow, Stefan Abdolvand, Amin |
author_facet | Himmerlich, Marcel Zanin, Danilo A Taborelli, Mauro Granadeiro Costa, Angelo Rafael Costa Pinto, Pedro Lain Amador, Lucia Vollenberg, Wilhelmus Baris, Adrienn Garcia‐Tabares Valdivieso, Elisa Perez Fontenla, Ana Teresa Wackerow, Stefan Abdolvand, Amin |
author_sort | Himmerlich, Marcel |
collection | CERN |
description | The formation of a fissured copper surface by picosecond pulsed laser irradiation is combined with functional coatings consisting of Ti and amorphous carbon layers or a Ti–Zr–V compound film to fabricate surfaces with the maximum of the secondary electron yield being as low as 0.4. By structural and spectroscopic analysis of the formed surfaces it is demonstrated that both coatings enclose the nanostructures generated by redeposition of metal structures from the laser-induced plasma plume, keeping the initial topography intact. This allows an efficient elimination of secondary electron emission by combining the benefits from structural surface modification and adaption of electronic surface properties to efficiently dissipate the energy of impinging electrons. Thermal activation tests of the Ti–Zr–V nonevaporable getter films revealed that for films on nanostructured substrates, which have a much higher effective surface, a slight diminution of surface activation occurs at 160 and 200 °C, while this effect is completely compensated when heating up to 250 °C indicating promising pumping capabilities. Both examples highlight the benefits from combining 3D substrate patterning with classical 2D deposition technologies. |
id | cern-2847604 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2022 |
record_format | invenio |
spelling | cern-28476042023-03-31T10:19:13Zdoi:10.1002/admi.202201671http://cds.cern.ch/record/2847604engHimmerlich, MarcelZanin, Danilo ATaborelli, MauroGranadeiro Costa, Angelo RafaelCosta Pinto, PedroLain Amador, LuciaVollenberg, WilhelmusBaris, AdriennGarcia‐Tabares Valdivieso, ElisaPerez Fontenla, Ana TeresaWackerow, StefanAbdolvand, AminEfficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter FilmsAccelerators and Storage RingsThe formation of a fissured copper surface by picosecond pulsed laser irradiation is combined with functional coatings consisting of Ti and amorphous carbon layers or a Ti–Zr–V compound film to fabricate surfaces with the maximum of the secondary electron yield being as low as 0.4. By structural and spectroscopic analysis of the formed surfaces it is demonstrated that both coatings enclose the nanostructures generated by redeposition of metal structures from the laser-induced plasma plume, keeping the initial topography intact. This allows an efficient elimination of secondary electron emission by combining the benefits from structural surface modification and adaption of electronic surface properties to efficiently dissipate the energy of impinging electrons. Thermal activation tests of the Ti–Zr–V nonevaporable getter films revealed that for films on nanostructured substrates, which have a much higher effective surface, a slight diminution of surface activation occurs at 160 and 200 °C, while this effect is completely compensated when heating up to 250 °C indicating promising pumping capabilities. Both examples highlight the benefits from combining 3D substrate patterning with classical 2D deposition technologies.oai:cds.cern.ch:28476042022 |
spellingShingle | Accelerators and Storage Rings Himmerlich, Marcel Zanin, Danilo A Taborelli, Mauro Granadeiro Costa, Angelo Rafael Costa Pinto, Pedro Lain Amador, Lucia Vollenberg, Wilhelmus Baris, Adrienn Garcia‐Tabares Valdivieso, Elisa Perez Fontenla, Ana Teresa Wackerow, Stefan Abdolvand, Amin Efficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter Films |
title | Efficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter Films |
title_full | Efficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter Films |
title_fullStr | Efficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter Films |
title_full_unstemmed | Efficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter Films |
title_short | Efficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter Films |
title_sort | efficient combination of surface texturing and functional coating for very low secondary electron yield surfaces and rough nonevaporable getter films |
topic | Accelerators and Storage Rings |
url | https://dx.doi.org/10.1002/admi.202201671 http://cds.cern.ch/record/2847604 |
work_keys_str_mv | AT himmerlichmarcel efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT zanindaniloa efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT taborellimauro efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT granadeirocostaangelorafael efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT costapintopedro efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT lainamadorlucia efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT vollenbergwilhelmus efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT barisadrienn efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT garciatabaresvaldiviesoelisa efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT perezfontenlaanateresa efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT wackerowstefan efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms AT abdolvandamin efficientcombinationofsurfacetexturingandfunctionalcoatingforverylowsecondaryelectronyieldsurfacesandroughnonevaporablegetterfilms |