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Emission channeling investigation of implantation defects and impurities in II-VI-semiconductors
| Autores principales: | , , |
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| Lenguaje: | eng |
| Publicado: |
1993
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| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/294751 |
| _version_ | 1780888878903721984 |
|---|---|
| author | Bollmann, J Czermak, A Jahn, S G |
| author_facet | Bollmann, J Czermak, A Jahn, S G |
| author_sort | Bollmann, J |
| collection | CERN |
| id | cern-294751 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 1993 |
| record_format | invenio |
| spelling | cern-2947512019-09-30T06:29:59Zhttp://cds.cern.ch/record/294751engBollmann, JCzermak, AJahn, S GEmission channeling investigation of implantation defects and impurities in II-VI-semiconductorsDetectors and Experimental TechniquesCERN-ISC-94-1ISC-P-59oai:cds.cern.ch:2947511993 |
| spellingShingle | Detectors and Experimental Techniques Bollmann, J Czermak, A Jahn, S G Emission channeling investigation of implantation defects and impurities in II-VI-semiconductors |
| title | Emission channeling investigation of implantation defects and impurities in II-VI-semiconductors |
| title_full | Emission channeling investigation of implantation defects and impurities in II-VI-semiconductors |
| title_fullStr | Emission channeling investigation of implantation defects and impurities in II-VI-semiconductors |
| title_full_unstemmed | Emission channeling investigation of implantation defects and impurities in II-VI-semiconductors |
| title_short | Emission channeling investigation of implantation defects and impurities in II-VI-semiconductors |
| title_sort | emission channeling investigation of implantation defects and impurities in ii-vi-semiconductors |
| topic | Detectors and Experimental Techniques |
| url | http://cds.cern.ch/record/294751 |
| work_keys_str_mv | AT bollmannj emissionchannelinginvestigationofimplantationdefectsandimpuritiesiniivisemiconductors AT czermaka emissionchannelinginvestigationofimplantationdefectsandimpuritiesiniivisemiconductors AT jahnsg emissionchannelinginvestigationofimplantationdefectsandimpuritiesiniivisemiconductors |