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Development of ion sources for ion projection lithography
Autores principales: | Lee, Y, Gough, R A, Kunkel, W B, Leung, K N, Perkins, L T, Pickard, D S, Sun, L Z, Vujic, J L, Williams, M D |
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Lenguaje: | eng |
Publicado: |
1996
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/308557 |
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