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Charge build-up by irradiation in Metal Oxide Semiconductor structures at cryogenic temperatures: basic mechanisms and influence of dose and dose rate
Autor principal: | Fourches, N T |
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Lenguaje: | eng |
Publicado: |
1996
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/313850 |
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