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Total dose behaviour of commercial submicron VLSI technologies at low dose rate
Autores principales: | Giraldo, A, Paccagnella, A, Dachs, C, Faccio, F, Heijne, Erik H M, Jarron, Pierre, Kloukinas, Kostas C, Marchioro, A |
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Lenguaje: | eng |
Publicado: |
1997
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/349583 |
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