Cargando…
Thick film SOI technology: characteristics of devices and performance of circuits for high-energy physics at cryogenic temperatures
Autores principales: | Fourches, N T, Abbon, P, Chipaux, Rémi, Delagnes, E, Orsier, E, Pailler, P, Du Port de Pontcharra, J, Rouger, M, Sueur, M, Truche, R |
---|---|
Lenguaje: | eng |
Publicado: |
1997
|
Materias: | |
Acceso en línea: | https://dx.doi.org/10.1016/S0168-9002(97)01032-2 http://cds.cern.ch/record/365111 |
Ejemplares similares
-
Silicon on insulator for ultra-hard applications - CEA SOI techologies
por: Leray, J L, et al.
Publicado: (1990) -
RD29 final status report: DMILL, a mixed analog-digital radiation hard technology for high energy physics electronics
por: Abbon, P, et al.
Publicado: (1997) -
RD9 final status report: a demonstrator analog signal processing circuit in a radiation hard SOI-CMOS technology
por: Heijne, Erik H M, et al.
Publicado: (1997) -
Low-voltage SOI CMOS VLSI devices and circuits
por: Kuo, James B, et al.
Publicado: (2004) -
RD29 status report, 1997: DMILL, a mixed analog-digital radiation hard technology for high energy physics electronics
por: Abbon, P, et al.
Publicado: (1997)