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Highly Charged Ion Production Using an Electrode in Biased and Floating Modes
One of the most popular ways to obtain higher beam intensities in ECR ion sources is to install an electrode (usually disc) into the plasma chamber. Examined this method in detail we found that majority of the groups observed the beam intensity improvement by supplying a suitable biased voltage to t...
| Autores principales: | , , , , , |
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| Lenguaje: | eng |
| Publicado: |
1999
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| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/426765 |