Vacuum properties of TiZrV non-evaporable getter films [for LHC vacuum system]

Sputter-deposited thin films of TiZrV are fully activated after 24 h "in situ" heating at 180 degrees C. This activation temperature is the lowest of some 18 different getter coatings studied so far, and it allows the use of the getter thin film technology with aluminium alloy vacuum chamb...

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Detalles Bibliográficos
Autores principales: Benvenuti, Cristoforo, Chiggiato, P, Costa-Pinto, P, Escudeiro-Santana, A, Hedley, T, Mongelluzzo, A, Ruzinov, V, Wevers, I
Lenguaje:eng
Publicado: 2001
Materias:
Accelerators and Storage Rings
Acceso en línea:http://cds.cern.ch/record/502993

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