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An AES Study of the Room Temperature Surface Conditioning of Technological Metal Surfaces by Electron Irradiation
The modifications to technological copper and niobium surfaces induced by 2.5 keV electron irradiation have been investigated in the context of the conditioning process occurring in particle accelerator ultra high vacuum systems. Changes in the elemental surface composition have been found using Sca...
Autores principales: | , , , , |
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Lenguaje: | eng |
Publicado: |
2002
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1016/S0169-4332(02)00868-1 http://cds.cern.ch/record/557148 |
Sumario: | The modifications to technological copper and niobium surfaces induced by 2.5 keV electron irradiation have been investigated in the context of the conditioning process occurring in particle accelerator ultra high vacuum systems. Changes in the elemental surface composition have been found using Scanning Auger Microscopy (SAM) by monitoring the carbon, oxygen and metal Auger peak intensities as a function of electron irradiation in the dose range 10-6 to 10-2 C mm-2. The surface analysis results are compared with electron dose dependent secondary electron and electron stimulated desorption yield measurements. Initially the electron irradiation causes a surface cleaning through electron stimulated desorption, in particular of hydrogen. During this period both the electron stimulated desorption and secondary electron yield decrease as a function of electron dose. When the electron dose exceeds 10-4 C mm-2 electron stimulated desorption yields are reduced by several orders of magnitude and the electron beam induced growth of a carbon layer becomes the dominant process. Simultaneously the secondary electron yield is further reduced to values which are below those of an atomically clean metal surface. |
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