Ion-induced desorption yield measurements from copper and aluminium

Ion-stimulated desorption yields of pure aluminium and OFHC copper samples, materials of high technological interest, have been measured in an ultra-high vacuum system both unbaked and after 24h baking at 200 degree C. Measurements for both materials were performed using incident ions of argon at energies of 3, 5 and 7keV. In addition, copper was bombarded with helium and neon ions at 5keV following system bake-out. The ion-stimulated desorption yields are discussed as a function of ion energy as well as a function of incident sample preparation and mass of the incident ions. Initial ion yields are linear with ion dose, which shows that desorption are a first-order phenomenon.