Cargando…

Handbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination control

Detalles Bibliográficos
Autor principal: Mattox, Donald M
Lenguaje:eng
Publicado: Noyes 1998
Materias:
Acceso en línea:http://cds.cern.ch/record/612995
_version_ 1780900262749143040
author Mattox, Donald M
author_facet Mattox, Donald M
author_sort Mattox, Donald M
collection CERN
id cern-612995
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 1998
publisher Noyes
record_format invenio
spelling cern-6129952021-04-22T02:39:36Zhttp://cds.cern.ch/record/612995engMattox, Donald MHandbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination controlEngineeringNoyesoai:cds.cern.ch:6129951998
spellingShingle Engineering
Mattox, Donald M
Handbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination control
title Handbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination control
title_full Handbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination control
title_fullStr Handbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination control
title_full_unstemmed Handbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination control
title_short Handbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination control
title_sort handbook of physical vapor deposition (pvd) processing: film formation, adhesion, surface preparation and contamination control
topic Engineering
url http://cds.cern.ch/record/612995
work_keys_str_mv AT mattoxdonaldm handbookofphysicalvapordepositionpvdprocessingfilmformationadhesionsurfacepreparationandcontaminationcontrol