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Handbook of chemical vapor deposition: principles, technology and applications

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now es...

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Detalles Bibliográficos
Autor principal: Pierson, Hugh O
Lenguaje:eng
Publicado: Noyes 1999
Materias:
Acceso en línea:http://cds.cern.ch/record/643994
Descripción
Sumario:Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest