Cargando…

Optical properties of silicon carbide polytypes below and around bandgap

The optical properties of SiC polytypes are discussed with relation to the structure of SiC. The main part of the paper review the detailed measurements of the uniaxial dielectric function below and around the minimum band gap, using phase-modulated spectroscopic ellipsometry, polarised light transm...

Descripción completa

Detalles Bibliográficos
Autor principal: Kildemo, M
Lenguaje:eng
Publicado: 2004
Materias:
Acceso en línea:https://dx.doi.org/10.1016/j.tsf.2003.11.291
http://cds.cern.ch/record/818545
_version_ 1780905489783062528
author Kildemo, M
author_facet Kildemo, M
author_sort Kildemo, M
collection CERN
description The optical properties of SiC polytypes are discussed with relation to the structure of SiC. The main part of the paper review the detailed measurements of the uniaxial dielectric function below and around the minimum band gap, using phase-modulated spectroscopic ellipsometry, polarised light transmission measurements or crossed polariser variable angle of incidence interferometry. In particular, the oscillations in the recorded ellipsometric intensities, due to interference between the ordinary and extraordinary modes, specific to thick uniaxial wafers, are used to accurately measure the below band gap dielectric difference. It is focused on the differences in optical properties among the polytypes, in order to investigate SE and closely related techniques as a candidate for bulk-material wafer inspection and characterisation. (37 refs).
id cern-818545
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2004
record_format invenio
spelling cern-8185452019-09-30T06:29:59Zdoi:10.1016/j.tsf.2003.11.291http://cds.cern.ch/record/818545engKildemo, MOptical properties of silicon carbide polytypes below and around bandgapCondensed MatterThe optical properties of SiC polytypes are discussed with relation to the structure of SiC. The main part of the paper review the detailed measurements of the uniaxial dielectric function below and around the minimum band gap, using phase-modulated spectroscopic ellipsometry, polarised light transmission measurements or crossed polariser variable angle of incidence interferometry. In particular, the oscillations in the recorded ellipsometric intensities, due to interference between the ordinary and extraordinary modes, specific to thick uniaxial wafers, are used to accurately measure the below band gap dielectric difference. It is focused on the differences in optical properties among the polytypes, in order to investigate SE and closely related techniques as a candidate for bulk-material wafer inspection and characterisation. (37 refs).oai:cds.cern.ch:8185452004
spellingShingle Condensed Matter
Kildemo, M
Optical properties of silicon carbide polytypes below and around bandgap
title Optical properties of silicon carbide polytypes below and around bandgap
title_full Optical properties of silicon carbide polytypes below and around bandgap
title_fullStr Optical properties of silicon carbide polytypes below and around bandgap
title_full_unstemmed Optical properties of silicon carbide polytypes below and around bandgap
title_short Optical properties of silicon carbide polytypes below and around bandgap
title_sort optical properties of silicon carbide polytypes below and around bandgap
topic Condensed Matter
url https://dx.doi.org/10.1016/j.tsf.2003.11.291
http://cds.cern.ch/record/818545
work_keys_str_mv AT kildemom opticalpropertiesofsiliconcarbidepolytypesbelowandaroundbandgap