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Advanced processing and characterization technologies : fabrication and characterization of semiconductor optoelectronic devices and integrated circuits

Detalles Bibliográficos
Autor principal: Holloway
Lenguaje:eng
Publicado: AIP 1991
Materias:
XX
Acceso en línea:http://cds.cern.ch/record/866769
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author Holloway
author_facet Holloway
author_sort Holloway
collection CERN
id cern-866769
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 1991
publisher AIP
record_format invenio
spelling cern-8667692021-04-25T17:25:53Zhttp://cds.cern.ch/record/866769engHollowayAdvanced processing and characterization technologies : fabrication and characterization of semiconductor optoelectronic devices and integrated circuitsXXAIPoai:cds.cern.ch:8667691991
spellingShingle XX
Holloway
Advanced processing and characterization technologies : fabrication and characterization of semiconductor optoelectronic devices and integrated circuits
title Advanced processing and characterization technologies : fabrication and characterization of semiconductor optoelectronic devices and integrated circuits
title_full Advanced processing and characterization technologies : fabrication and characterization of semiconductor optoelectronic devices and integrated circuits
title_fullStr Advanced processing and characterization technologies : fabrication and characterization of semiconductor optoelectronic devices and integrated circuits
title_full_unstemmed Advanced processing and characterization technologies : fabrication and characterization of semiconductor optoelectronic devices and integrated circuits
title_short Advanced processing and characterization technologies : fabrication and characterization of semiconductor optoelectronic devices and integrated circuits
title_sort advanced processing and characterization technologies : fabrication and characterization of semiconductor optoelectronic devices and integrated circuits
topic XX
url http://cds.cern.ch/record/866769
work_keys_str_mv AT holloway advancedprocessingandcharacterizationtechnologiesfabricationandcharacterizationofsemiconductoroptoelectronicdevicesandintegratedcircuits