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Diffusion of $^{6}$Li in Ta and W
The objective of this work was the study of 6Li diffusion in the Ta and W refractory metals. The samples were prepared by ion implantation of 380 keV 6Li+ ions into W and Ta thin foils (up to the fluence of 1016 ions/cm2) and annealed up to the temperature 1940 °C. The depth profiles of 6Li were det...
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| Lenguaje: | eng |
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2006
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| Acceso en línea: | https://dx.doi.org/10.1016/j.nimb.2006.03.153 http://cds.cern.ch/record/964987 |