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Surface Characterization at CERN of Photocathodes for Photoinjector Applications
R&D; on photocathodes takes place at CERN within the CLIC (Compact Linear Collider) project. Photocathodes are produced as thin films on Oxygen Free copper substrate using a co-deposition technique, and characterized in a dedicated laboratory with a DC photo-electron gun. A new UHV carrier vesse...
Autores principales: | , , , , , , |
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Lenguaje: | eng |
Publicado: |
2015
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2141824 |
Sumario: | R&D; on photocathodes takes place at CERN within the CLIC (Compact Linear Collider) project. Photocathodes are produced as thin films on Oxygen Free copper substrate using a co-deposition technique, and characterized in a dedicated laboratory with a DC photo-electron gun. A new UHV carrier vessel compatible with CERN’s XPS (X-ray Photoelectron Spectroscopy) analysis equipment has been commissioned and is used to transport photocathodes from the production laboratory to perform a systematic study of different compounds used as photoemissive materials. In this paper photocathodes used in a RF photoinjector will be characterized and the correlation of their surface properties with their performance will be investigated. |
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