Photodesorption and Electron Yield Measurements of Thin Film Coatings for Future Accelerators

The performance of future accelerators could be limited by electron cloud phenomena and high photodesorption yields. For such a reason, the study of secondary electron and photodesorption yields of vacuum materials is essential. The eradication or mitigation of both secondary electron and molecule desorption could strongly reduce the beam scrubbing time and increase the availability of nominal beams for experiments. Surface modifications with the desired characteristics can be achieved by thin-film coatings, in particular made of amorphous carbon and non-evaporable getters (NEG). In the framework of a new collaboration, several vacuum chambers have been produced, and different coatings on each of them have been applied. The samples were then irradiated at KEK’s Photon Factory with SR light of 4 keV critical energy during several days, allowing the measurement of the photodesorption yield as a function of the photon dose. This paper presents the experiment and briefly summarizes the preliminary photodesorption and photoelectron yield data of different coatings. The results can be used for future machine design with similar conditions, such as the FCC-hh.