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Evidence of ion energy distribution shift in HiPIMS plasmas with positive pulse
The deposition of a dense and void-free coating in complex geometries can be obtained with High Power Impulse Magnetron Sputtering (HiPIMS) by negatively biasing the substrate. This accelerates the incoming metal ions that consequently densify the film. However, a biased substrate can be a technical...
| Autores principales: | , , |
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| Lenguaje: | eng |
| Publicado: |
2019
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1088/1361-6595/aaf5c9 https://dx.doi.org/10.1088/1361-6595/ab2b1d http://cds.cern.ch/record/2655801 |