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Technological aspects of thin film formation on the rotor of spherical gyroscopes
A scheme of fixation in a technological device during thin film deposition process is considered for the spherical rotor of electrostatic and cryogenic gyroscopes. Calculations of the fixing scheme parameters, based on the contrast image zone location are presented. The influence of the fixing schem...
| Autores principales: | , |
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| Lenguaje: | eng |
| Publicado: |
2020
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| Acceso en línea: | https://dx.doi.org/10.1088/1742-6596/1536/1/012011 http://cds.cern.ch/record/2719100 |
| _version_ | 1780965717550563328 |
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| author | Tit, M A Scherbak, A G |
| author_facet | Tit, M A Scherbak, A G |
| author_sort | Tit, M A |
| collection | CERN |
| description | A scheme of fixation in a technological device during thin film deposition process is considered for the spherical rotor of electrostatic and cryogenic gyroscopes. Calculations of the fixing scheme parameters, based on the contrast image zone location are presented. The influence of the fixing scheme on the rotor imbalance is evaluated. The dependence of the difference between the initial and post-deposition imbalance on rotor and thin film parameters is obtained. Comparison of the dependencies obtained for electrostatic and cryogenic gyroscope rotor is shown. |
| id | oai-inspirehep.net-1797607 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 2020 |
| record_format | invenio |
| spelling | oai-inspirehep.net-17976072021-02-09T10:07:01Zdoi:10.1088/1742-6596/1536/1/012011http://cds.cern.ch/record/2719100engTit, M AScherbak, A GTechnological aspects of thin film formation on the rotor of spherical gyroscopesA scheme of fixation in a technological device during thin film deposition process is considered for the spherical rotor of electrostatic and cryogenic gyroscopes. Calculations of the fixing scheme parameters, based on the contrast image zone location are presented. The influence of the fixing scheme on the rotor imbalance is evaluated. The dependence of the difference between the initial and post-deposition imbalance on rotor and thin film parameters is obtained. Comparison of the dependencies obtained for electrostatic and cryogenic gyroscope rotor is shown.oai:inspirehep.net:17976072020 |
| spellingShingle | Tit, M A Scherbak, A G Technological aspects of thin film formation on the rotor of spherical gyroscopes |
| title | Technological aspects of thin film formation on the rotor of spherical gyroscopes |
| title_full | Technological aspects of thin film formation on the rotor of spherical gyroscopes |
| title_fullStr | Technological aspects of thin film formation on the rotor of spherical gyroscopes |
| title_full_unstemmed | Technological aspects of thin film formation on the rotor of spherical gyroscopes |
| title_short | Technological aspects of thin film formation on the rotor of spherical gyroscopes |
| title_sort | technological aspects of thin film formation on the rotor of spherical gyroscopes |
| url | https://dx.doi.org/10.1088/1742-6596/1536/1/012011 http://cds.cern.ch/record/2719100 |
| work_keys_str_mv | AT titma technologicalaspectsofthinfilmformationontherotorofsphericalgyroscopes AT scherbakag technologicalaspectsofthinfilmformationontherotorofsphericalgyroscopes |