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Improved film density for coatings at grazing angle of incidence in high power impulse magnetron sputtering with positive pulse
The production of a dense and void-free thin film on large and complex substrates is still a challenge in Physical Vapor Deposition. High Power Impulse Magnetron Sputtering (HiPIMS) with voltage inversion (positive pulse) after the main negative pulse is an attractive alternative to a negatively bia...
| Autores principales: | , , , , , , , |
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| Lenguaje: | eng |
| Publicado: |
2020
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1016/j.tsf.2020.138058 http://cds.cern.ch/record/2725889 |