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Design of large scale sensors in 180 nm CMOS process modified for radiation tolerance

The last couple of years have seen the development of Depleted Monolithic Active Pixel Sensors (DMAPS) fabricated with a process modification to increase the radiation tolerance. Two large scale prototypes, Monopix with a column drain synchronous readout, and MALTA with a novel asynchronous architec...

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Detalles Bibliográficos
Autores principales: Flores Sanz de Acedo, L, Asensi Tortajada, I, Barbero, M, Berdalovic, I, Bespin, C, Bortoletto, D, Buttar, C, Caicedo, I, Cardella, R, Dachs, F, Dao, V, Degerli, Y, Dyndal, M, Freeman, P, Habib, A, Hemperek, T, Hirono, T, Kugathasan, T, Moustakas, K, Munker, M, Pernegger, H, Piro, F, Riedler, P, Rymaszewski, P, Schioppa, E J, Schwemling, P, Sharma, A, Argemi, L Simon, Snoeys, W, Sanchez, C Solans, Wang, T, Wermes, N
Lenguaje:eng
Publicado: 2020
Materias:
Acceso en línea:https://dx.doi.org/10.1016/j.nima.2020.164403
http://cds.cern.ch/record/2729064

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