Cargando…

Photo reflectivity and photo electron yield from technical surfaces

The knowledge of material properties is an essential stepto design particle accelerators and High Energy Colliders.During operation of these machines, the walls of the vac-uum chambers are subjected to bombardment of photonsand electrons. The detrimental interactions may be followedby issues related...

Descripción completa

Detalles Bibliográficos
Autores principales: Liedl, A, Angelucci, M, La Francesca, E, Schäfers, F, Sertsu, M G, Siewert, F, Sokolov, A, Cimino, R
Lenguaje:eng
Publicado: 2020
Materias:
Acceso en línea:https://dx.doi.org/10.23732/CYRCP-2020-007.125
http://cds.cern.ch/record/2737332
_version_ 1780967744487817216
author Liedl, A
Angelucci, M
La Francesca, E
Schäfers, F
Sertsu, M G
Siewert, F
Sokolov, A
Cimino, R
author_facet Liedl, A
Angelucci, M
La Francesca, E
Schäfers, F
Sertsu, M G
Siewert, F
Sokolov, A
Cimino, R
author_sort Liedl, A
collection CERN
description The knowledge of material properties is an essential stepto design particle accelerators and High Energy Colliders.During operation of these machines, the walls of the vac-uum chambers are subjected to bombardment of photonsand electrons. The detrimental interactions may be followedby issues related to vacuum and beam instability. Hence,it becomes crucial to obtain experimental data about theseinteraction in conditions as close as possible to the operativeones. Among others properties, Reflectivity ( both specu-lar and total component) and photoyield are of particularinterest. These data will be used in numerical simulationsto design vacuum systems. In an experimental campaign,carried out at the OPTICS beamline of BESSYII, we inves-tigated the Reflectivity and the Photon Yield of technicalmaterials of interest for the High Luminosity LHC upgradeand Future Circular Collider-hh design.
id oai-inspirehep.net-1820074
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2020
record_format invenio
spelling oai-inspirehep.net-18200742020-12-11T22:26:21Zdoi:10.23732/CYRCP-2020-007.125http://cds.cern.ch/record/2737332engLiedl, AAngelucci, MLa Francesca, ESchäfers, FSertsu, M GSiewert, FSokolov, ACimino, RPhoto reflectivity and photo electron yield from technical surfacesAccelerators and Storage RingsThe knowledge of material properties is an essential stepto design particle accelerators and High Energy Colliders.During operation of these machines, the walls of the vac-uum chambers are subjected to bombardment of photonsand electrons. The detrimental interactions may be followedby issues related to vacuum and beam instability. Hence,it becomes crucial to obtain experimental data about theseinteraction in conditions as close as possible to the operativeones. Among others properties, Reflectivity ( both specu-lar and total component) and photoyield are of particularinterest. These data will be used in numerical simulationsto design vacuum systems. In an experimental campaign,carried out at the OPTICS beamline of BESSYII, we inves-tigated the Reflectivity and the Photon Yield of technicalmaterials of interest for the High Luminosity LHC upgradeand Future Circular Collider-hh design.oai:inspirehep.net:18200742020
spellingShingle Accelerators and Storage Rings
Liedl, A
Angelucci, M
La Francesca, E
Schäfers, F
Sertsu, M G
Siewert, F
Sokolov, A
Cimino, R
Photo reflectivity and photo electron yield from technical surfaces
title Photo reflectivity and photo electron yield from technical surfaces
title_full Photo reflectivity and photo electron yield from technical surfaces
title_fullStr Photo reflectivity and photo electron yield from technical surfaces
title_full_unstemmed Photo reflectivity and photo electron yield from technical surfaces
title_short Photo reflectivity and photo electron yield from technical surfaces
title_sort photo reflectivity and photo electron yield from technical surfaces
topic Accelerators and Storage Rings
url https://dx.doi.org/10.23732/CYRCP-2020-007.125
http://cds.cern.ch/record/2737332
work_keys_str_mv AT liedla photoreflectivityandphotoelectronyieldfromtechnicalsurfaces
AT angeluccim photoreflectivityandphotoelectronyieldfromtechnicalsurfaces
AT lafrancescae photoreflectivityandphotoelectronyieldfromtechnicalsurfaces
AT schafersf photoreflectivityandphotoelectronyieldfromtechnicalsurfaces
AT sertsumg photoreflectivityandphotoelectronyieldfromtechnicalsurfaces
AT siewertf photoreflectivityandphotoelectronyieldfromtechnicalsurfaces
AT sokolova photoreflectivityandphotoelectronyieldfromtechnicalsurfaces
AT ciminor photoreflectivityandphotoelectronyieldfromtechnicalsurfaces