Si-Cr Nano-Alloys Fabricated by Direct Femtosecond Laser Writing

Ultra-short 230 fs laser pulses of 515 nm wavelength were tightly focused into 700 nm focal spots and utilised in opening ∼400 nm nano-holes in a Cr etch mask that was tens-of-nm thick. The ablation threshold was found to be 2.3 nJ/pulse, double that of plain silicon. Nano-holes irradiated with puls...

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Detalles Bibliográficos
Autores principales: Maksimovic, Jovan, Mu, Haoran, Han, Molong, Smith, Daniel, Katkus, Tomas, Anand, Vijayakumar, Nishijima, Yoshiaki, Ng, Soon Hock, Juodkazis, Saulius
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10004396/
https://www.ncbi.nlm.nih.gov/pubmed/36903030
http://dx.doi.org/10.3390/ma16051917

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10004396/
https://www.ncbi.nlm.nih.gov/pubmed/36903030
http://dx.doi.org/10.3390/ma16051917

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