Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process

The importance of monitoring the electron density uniformity of plasma has attracted significant attention in material processing, with the goal of improving production yield. This paper presents a non-invasive microwave probe for in-situ monitoring electron density uniformity, called the Tele-measu...

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Detalles Bibliográficos
Autores principales: Kim, Si-Jun, Choi, Min-Su, Lee, Sang-Ho, Jeong, Won-Nyoung, Lee, Young-Seok, Seong, In-Ho, Cho, Chul-Hee, Kim, Dae-Woong, You, Shin-Jae
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10006970/
https://www.ncbi.nlm.nih.gov/pubmed/36904724
http://dx.doi.org/10.3390/s23052521

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10006970/
https://www.ncbi.nlm.nih.gov/pubmed/36904724
http://dx.doi.org/10.3390/s23052521

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