Wafer Type Ion Energy Monitoring Sensor for Plasma Diagnosis

We propose a wafer-type ion energy monitoring sensor (IEMS) that can measure the spatially resolved distribution of ion energy over the 150 mm plasma chamber for the in situ monitoring of the semiconductor fabrication process. The IEMS can directly be applied to the semiconductor chip production equ...

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Detalles Bibliográficos
Autores principales: Han, Chansu, Koo, Yoonsung, Kim, Jaehwan, Choi, Kwangwook, Hong, Sangjeen
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Communication
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10007180/
https://www.ncbi.nlm.nih.gov/pubmed/36904613
http://dx.doi.org/10.3390/s23052410

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10007180/
https://www.ncbi.nlm.nih.gov/pubmed/36904613
http://dx.doi.org/10.3390/s23052410

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