Studies of Electrical Parameters and Thermal Stability of HiPIMS Hafnium Oxynitride (HfO(x)N(y)) Thin Films

This work demonstrated the optimization of HiPIMS reactive magnetron sputtering of hafnium oxynitride (HfO(x)N(y)) thin films. During the optimization procedure, employing Taguchi orthogonal tables, the parameters of examined dielectric films were explored, utilizing optical methods (spectroscopic e...

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Detalles Bibliográficos
Autores principales: Puźniak, Mirosław, Gajewski, Wojciech, Seweryn, Aleksandra, Klepka, Marcin T., Witkowski, Bartłomiej S., Godlewski, Marek, Mroczyński, Robert
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10051222/
https://www.ncbi.nlm.nih.gov/pubmed/36984417
http://dx.doi.org/10.3390/ma16062539

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10051222/
https://www.ncbi.nlm.nih.gov/pubmed/36984417
http://dx.doi.org/10.3390/ma16062539

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