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Bi(2)Te(3) Thin Films Deposited by the Combination of Bi and Te Plasmas in a PLD Process

Bismuth telluride thin films were grown by pulsed laser deposition by implementing a novel method that combines both Te and Bi plasmas resulting from the laser ablation of individual Bi and Te targets. Furthermore, the mean kinetic ion energy and density of the plasmas, as estimated by TOF curves ob...

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Autores principales: Reyes-Verdugo, Laura A., Gutiérrez-Lazos, C. D., Santos-Cruz, J., Chávez-Chávez, A., Quiñones-Galván, J. G.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10053450/
https://www.ncbi.nlm.nih.gov/pubmed/36984996
http://dx.doi.org/10.3390/mi14030590
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author Reyes-Verdugo, Laura A.
Gutiérrez-Lazos, C. D.
Santos-Cruz, J.
Chávez-Chávez, A.
Quiñones-Galván, J. G.
author_facet Reyes-Verdugo, Laura A.
Gutiérrez-Lazos, C. D.
Santos-Cruz, J.
Chávez-Chávez, A.
Quiñones-Galván, J. G.
author_sort Reyes-Verdugo, Laura A.
collection PubMed
description Bismuth telluride thin films were grown by pulsed laser deposition by implementing a novel method that combines both Te and Bi plasmas resulting from the laser ablation of individual Bi and Te targets. Furthermore, the mean kinetic ion energy and density of the plasmas, as estimated by TOF curves obtained from Langmuir probe measurements, were used as control parameters for the deposition process. The obtained thin films exhibit a metallic mirror-like appearance and present good adhesion to the substrate. Morphology of the thin films was observed by SEM, yielding smooth surfaces where particulates were also observed (splashing). Chemical composition analysis obtained by EDS showed that apparently the films have a Te-rich composition (ratio of Te/Bi of 3); however, Te excess arises from the splashing as revealed by the structural characterization (XRD and Raman spectroscopy). The XRD pattern indicated that depositions have the rhombohedral ([Formula: see text] ([Formula: see text]) structure of Bi(2)Te(3). Likewise, Raman spectra exhibited the presence of signals that correspond to [Formula: see text] , [Formula: see text] and [Formula: see text] (LO) vibrational modes of the same rhombohedral phase of Bi(2)Te(3). Additionally, oxidation states, analyzed by XPS, resulted in signals associated to Bi(3+) and Te(2-) that correspond to the Bi(2)Te(3) compound. Finally, surface topology and thickness profiles were obtained from AFM measurements, confirming a combination of a smooth surface with particulates on top of it and a film thickness of 400 nm.
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spelling pubmed-100534502023-03-30 Bi(2)Te(3) Thin Films Deposited by the Combination of Bi and Te Plasmas in a PLD Process Reyes-Verdugo, Laura A. Gutiérrez-Lazos, C. D. Santos-Cruz, J. Chávez-Chávez, A. Quiñones-Galván, J. G. Micromachines (Basel) Article Bismuth telluride thin films were grown by pulsed laser deposition by implementing a novel method that combines both Te and Bi plasmas resulting from the laser ablation of individual Bi and Te targets. Furthermore, the mean kinetic ion energy and density of the plasmas, as estimated by TOF curves obtained from Langmuir probe measurements, were used as control parameters for the deposition process. The obtained thin films exhibit a metallic mirror-like appearance and present good adhesion to the substrate. Morphology of the thin films was observed by SEM, yielding smooth surfaces where particulates were also observed (splashing). Chemical composition analysis obtained by EDS showed that apparently the films have a Te-rich composition (ratio of Te/Bi of 3); however, Te excess arises from the splashing as revealed by the structural characterization (XRD and Raman spectroscopy). The XRD pattern indicated that depositions have the rhombohedral ([Formula: see text] ([Formula: see text]) structure of Bi(2)Te(3). Likewise, Raman spectra exhibited the presence of signals that correspond to [Formula: see text] , [Formula: see text] and [Formula: see text] (LO) vibrational modes of the same rhombohedral phase of Bi(2)Te(3). Additionally, oxidation states, analyzed by XPS, resulted in signals associated to Bi(3+) and Te(2-) that correspond to the Bi(2)Te(3) compound. Finally, surface topology and thickness profiles were obtained from AFM measurements, confirming a combination of a smooth surface with particulates on top of it and a film thickness of 400 nm. MDPI 2023-02-28 /pmc/articles/PMC10053450/ /pubmed/36984996 http://dx.doi.org/10.3390/mi14030590 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Reyes-Verdugo, Laura A.
Gutiérrez-Lazos, C. D.
Santos-Cruz, J.
Chávez-Chávez, A.
Quiñones-Galván, J. G.
Bi(2)Te(3) Thin Films Deposited by the Combination of Bi and Te Plasmas in a PLD Process
title Bi(2)Te(3) Thin Films Deposited by the Combination of Bi and Te Plasmas in a PLD Process
title_full Bi(2)Te(3) Thin Films Deposited by the Combination of Bi and Te Plasmas in a PLD Process
title_fullStr Bi(2)Te(3) Thin Films Deposited by the Combination of Bi and Te Plasmas in a PLD Process
title_full_unstemmed Bi(2)Te(3) Thin Films Deposited by the Combination of Bi and Te Plasmas in a PLD Process
title_short Bi(2)Te(3) Thin Films Deposited by the Combination of Bi and Te Plasmas in a PLD Process
title_sort bi(2)te(3) thin films deposited by the combination of bi and te plasmas in a pld process
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10053450/
https://www.ncbi.nlm.nih.gov/pubmed/36984996
http://dx.doi.org/10.3390/mi14030590
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