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The Influence of Annealing and Film Thickness on the Specific Properties of Co(40)Fe(40)Y(20) Films

Cobalt Iron Yttrium (CoFeY) magnetic film was made using the sputtering technique in order to investigate the connection between the thickness and annealing procedures. The sample was amorphous as a result of an insufficient thermal driving force according to X-ray diffraction (XRD) examination. The...

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Detalles Bibliográficos
Autores principales: Liu, Wen-Jen, Chang, Yung-Huang, Chiang, Chia-Chin, Chen, Yuan-Tsung, Liu, Yu-Chi, Huang, Yu-Jie, Chi, Po-Wei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10056263/
https://www.ncbi.nlm.nih.gov/pubmed/36984370
http://dx.doi.org/10.3390/ma16062490
Descripción
Sumario:Cobalt Iron Yttrium (CoFeY) magnetic film was made using the sputtering technique in order to investigate the connection between the thickness and annealing procedures. The sample was amorphous as a result of an insufficient thermal driving force according to X-ray diffraction (XRD) examination. The maximum low-frequency alternate-current magnetic susceptibility (χ(ac)) values were raised in correlation with the increased thickness and annealing temperatures because the thickness effect and Y addition improved the spin exchange coupling. The best value for a 50 nm film at annealing 300 °C for χ(ac) was 0.20. Because electron carriers are less constrained in their conduction at thick film thickness and higher annealing temperatures, the electric resistivity and sheet resistance are lower. At a thickness of 40 nm, the film’s maximum surface energy during annealing at 300 °C was 28.7 mJ/mm(2). This study demonstrated the passage of photon signals through the film due to the thickness effect, which reduced transmittance. The best condition was found to be 50 nm with annealing at 300 °C in this investigation due to high χ(ac), strong adhesion, and low resistivity, which can be used in magnetic fields.