Cargando…
Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation
Plasmonic lithography, which uses the evanescent electromagnetic (EM) fields to generate image beyond the diffraction limit, has been successfully demonstrated as an alternative lithographic technology for creating sub-10 nm patterns. However, the obtained photoresist pattern contour in general exhi...
| Autores principales: | , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2023
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10060221/ https://www.ncbi.nlm.nih.gov/pubmed/37007604 http://dx.doi.org/10.1038/s41378-023-00512-4 |