Cargando…
Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method
Despite over 90 years of study on the emissive probe, a plasma diagnostic tool used to measure plasma potential, its underlying physics has yet to be fully understood. In this study, we investigated the voltages along the hot filament wire and emitting thermal electrons and proved which voltage refl...
Autores principales: | Cho, Chulhee, Kim, Sijun, Lee, Youngseok, Seong, Inho, Jeong, Wonnyoung, You, Yebin, Choi, Minsu, You, Shinjae |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10095820/ https://www.ncbi.nlm.nih.gov/pubmed/37049056 http://dx.doi.org/10.3390/ma16072762 |
Ejemplares similares
-
Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma
por: Cho, Chulhee, et al.
Publicado: (2022) -
Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma
por: Seong, Inho, et al.
Publicado: (2023) -
Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath
por: Seong, Inho, et al.
Publicado: (2022) -
Characterization of SiO(2) Plasma Etching with Perfluorocarbon (C(4)F(8) and C(6)F(6)) and Hydrofluorocarbon (CHF(3) and C(4)H(2)F(6)) Precursors for the Greenhouse Gas Emissions Reduction
por: Choi, Minsu, et al.
Publicado: (2023) -
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO(2) Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C(4)F(8) Plasma: Individual Ion Energy and Flux Controlled
por: Jeong, Wonnyoung, et al.
Publicado: (2023)