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Study on Tungsten Metallization and Interfacial Bonding of Silicon Nitride High-Temperature Co-Fired Ceramic Substrates

For the first time, Si(3)N(4) HTCC has been prepared using W as the metal phase by high-temperature co-firing (1830 °C/600 KPa/2 h) as a potential substrate candidate in electronic applications. It was discovered that the addition of Si(3)N(4) to the W paste has a significant impact on thermal expan...

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Detalles Bibliográficos
Autores principales: Wang, Ling-Feng, Li, Zhe, Zhou, Bo-An, Duan, Yu-Sen, Liu, Ning, Zhang, Jing-Xian
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10096375/
https://www.ncbi.nlm.nih.gov/pubmed/37049231
http://dx.doi.org/10.3390/ma16072937

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