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Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds

BACKGROUND: Vanilla planifolia is the most widely cultivated species of vanilla with high economic importance. However, seed germination under artificial conditions is difficult and yields low germination percentages. The seeds are adapted to endozoochorous dispersal, and we therefore tried to simul...

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Autores principales: Šoch, Jan, Šonka, Josef, Ponert, Jan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer Nature Singapore 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10110789/
https://www.ncbi.nlm.nih.gov/pubmed/37067667
http://dx.doi.org/10.1186/s40529-023-00374-z
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author Šoch, Jan
Šonka, Josef
Ponert, Jan
author_facet Šoch, Jan
Šonka, Josef
Ponert, Jan
author_sort Šoch, Jan
collection PubMed
description BACKGROUND: Vanilla planifolia is the most widely cultivated species of vanilla with high economic importance. However, seed germination under artificial conditions is difficult and yields low germination percentages. The seeds are adapted to endozoochorous dispersal, and we therefore tried to simulate the conditions in the digestive tract by acid scarification of seeds. RESULTS: Immature seeds lacking dormancy, used as a control, showed the highest germination percentage. Among the treatments tested for mature seeds, the hydrochloric acid treatments were significantly the best in breaking dormancy and inducing germination, irrespective of the acid concentration and the presence of pepsin. Conventional treatment with a hypochlorite solution induced much lower germination percentage. Sulphuric acid at concentration 50% was too strong and caused damage to the seeds. Important factor is also high cultivation temperature 30 °C as there was nearly no germination at 25 °C. CONCLUSIONS: Our protocol significantly improves the efficiency of generative propagation of vanilla and allows for significantly higher germination percentages than previously described. The strongly positive effect of hydrochloric acid may be related to the adaptation of seeds to endozoochorous dispersal. SUPPLEMENTARY INFORMATION: The online version contains supplementary material available at 10.1186/s40529-023-00374-z.
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spelling pubmed-101107892023-04-19 Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds Šoch, Jan Šonka, Josef Ponert, Jan Bot Stud Original Article BACKGROUND: Vanilla planifolia is the most widely cultivated species of vanilla with high economic importance. However, seed germination under artificial conditions is difficult and yields low germination percentages. The seeds are adapted to endozoochorous dispersal, and we therefore tried to simulate the conditions in the digestive tract by acid scarification of seeds. RESULTS: Immature seeds lacking dormancy, used as a control, showed the highest germination percentage. Among the treatments tested for mature seeds, the hydrochloric acid treatments were significantly the best in breaking dormancy and inducing germination, irrespective of the acid concentration and the presence of pepsin. Conventional treatment with a hypochlorite solution induced much lower germination percentage. Sulphuric acid at concentration 50% was too strong and caused damage to the seeds. Important factor is also high cultivation temperature 30 °C as there was nearly no germination at 25 °C. CONCLUSIONS: Our protocol significantly improves the efficiency of generative propagation of vanilla and allows for significantly higher germination percentages than previously described. The strongly positive effect of hydrochloric acid may be related to the adaptation of seeds to endozoochorous dispersal. SUPPLEMENTARY INFORMATION: The online version contains supplementary material available at 10.1186/s40529-023-00374-z. Springer Nature Singapore 2023-04-17 /pmc/articles/PMC10110789/ /pubmed/37067667 http://dx.doi.org/10.1186/s40529-023-00374-z Text en © The Author(s) 2023 https://creativecommons.org/licenses/by/4.0/Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Original Article
Šoch, Jan
Šonka, Josef
Ponert, Jan
Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds
title Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds
title_full Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds
title_fullStr Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds
title_full_unstemmed Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds
title_short Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds
title_sort acid scarification as a potent treatment for an in vitro germination of mature endozoochorous vanilla planifolia seeds
topic Original Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10110789/
https://www.ncbi.nlm.nih.gov/pubmed/37067667
http://dx.doi.org/10.1186/s40529-023-00374-z
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