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New Atomistic Insights on the Chemical Mechanical Polishing of Silica Glass with Ceria Nanoparticles
[Image: see text] Reactive molecular dynamics simulations have been used to simulate the chemical mechanical polishing (CMP) process of silica glass surfaces with the ceria (111) and (100) surfaces, which are predominantly found in ceria nanoparticles. Since it is known that an alteration layer is f...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10116594/ https://www.ncbi.nlm.nih.gov/pubmed/37029752 http://dx.doi.org/10.1021/acs.langmuir.3c00304 |