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Van der Waals nanomesh electronics on arbitrary surfaces

Chemical bonds, including covalent and ionic bonds, endow semiconductors with stable electronic configurations but also impose constraints on their synthesis and lattice-mismatched heteroepitaxy. Here, the unique multi-scale van der Waals (vdWs) interactions are explored in one-dimensional tellurium...

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Autores principales: Meng, You, Li, Xiaocui, Kang, Xiaolin, Li, Wanpeng, Wang, Wei, Lai, Zhengxun, Wang, Weijun, Quan, Quan, Bu, Xiuming, Yip, SenPo, Xie, Pengshan, Chen, Dong, Li, Dengji, Wang, Fei, Yeung, Chi-Fung, Lan, Changyong, Liu, Chuntai, Shen, Lifan, Lu, Yang, Chen, Furong, Wong, Chun-Yuen, Ho, Johnny C.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10140039/
https://www.ncbi.nlm.nih.gov/pubmed/37105992
http://dx.doi.org/10.1038/s41467-023-38090-8
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author Meng, You
Li, Xiaocui
Kang, Xiaolin
Li, Wanpeng
Wang, Wei
Lai, Zhengxun
Wang, Weijun
Quan, Quan
Bu, Xiuming
Yip, SenPo
Xie, Pengshan
Chen, Dong
Li, Dengji
Wang, Fei
Yeung, Chi-Fung
Lan, Changyong
Liu, Chuntai
Shen, Lifan
Lu, Yang
Chen, Furong
Wong, Chun-Yuen
Ho, Johnny C.
author_facet Meng, You
Li, Xiaocui
Kang, Xiaolin
Li, Wanpeng
Wang, Wei
Lai, Zhengxun
Wang, Weijun
Quan, Quan
Bu, Xiuming
Yip, SenPo
Xie, Pengshan
Chen, Dong
Li, Dengji
Wang, Fei
Yeung, Chi-Fung
Lan, Changyong
Liu, Chuntai
Shen, Lifan
Lu, Yang
Chen, Furong
Wong, Chun-Yuen
Ho, Johnny C.
author_sort Meng, You
collection PubMed
description Chemical bonds, including covalent and ionic bonds, endow semiconductors with stable electronic configurations but also impose constraints on their synthesis and lattice-mismatched heteroepitaxy. Here, the unique multi-scale van der Waals (vdWs) interactions are explored in one-dimensional tellurium (Te) systems to overcome these restrictions, enabled by the vdWs bonds between Te atomic chains and the spontaneous misfit relaxation at quasi-vdWs interfaces. Wafer-scale Te vdWs nanomeshes composed of self-welding Te nanowires are laterally vapor grown on arbitrary surfaces at a low temperature of 100 °C, bringing greater integration freedoms for enhanced device functionality and broad applicability. The prepared Te vdWs nanomeshes can be patterned at the microscale and exhibit high field-effect hole mobility of 145 cm(2)/Vs, ultrafast photoresponse below 3 μs in paper-based infrared photodetectors, as well as controllable electronic structure in mixed-dimensional heterojunctions. All these device metrics of Te vdWs nanomesh electronics are promising to meet emerging technological demands.
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spelling pubmed-101400392023-04-29 Van der Waals nanomesh electronics on arbitrary surfaces Meng, You Li, Xiaocui Kang, Xiaolin Li, Wanpeng Wang, Wei Lai, Zhengxun Wang, Weijun Quan, Quan Bu, Xiuming Yip, SenPo Xie, Pengshan Chen, Dong Li, Dengji Wang, Fei Yeung, Chi-Fung Lan, Changyong Liu, Chuntai Shen, Lifan Lu, Yang Chen, Furong Wong, Chun-Yuen Ho, Johnny C. Nat Commun Article Chemical bonds, including covalent and ionic bonds, endow semiconductors with stable electronic configurations but also impose constraints on their synthesis and lattice-mismatched heteroepitaxy. Here, the unique multi-scale van der Waals (vdWs) interactions are explored in one-dimensional tellurium (Te) systems to overcome these restrictions, enabled by the vdWs bonds between Te atomic chains and the spontaneous misfit relaxation at quasi-vdWs interfaces. Wafer-scale Te vdWs nanomeshes composed of self-welding Te nanowires are laterally vapor grown on arbitrary surfaces at a low temperature of 100 °C, bringing greater integration freedoms for enhanced device functionality and broad applicability. The prepared Te vdWs nanomeshes can be patterned at the microscale and exhibit high field-effect hole mobility of 145 cm(2)/Vs, ultrafast photoresponse below 3 μs in paper-based infrared photodetectors, as well as controllable electronic structure in mixed-dimensional heterojunctions. All these device metrics of Te vdWs nanomesh electronics are promising to meet emerging technological demands. Nature Publishing Group UK 2023-04-27 /pmc/articles/PMC10140039/ /pubmed/37105992 http://dx.doi.org/10.1038/s41467-023-38090-8 Text en © The Author(s) 2023 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Article
Meng, You
Li, Xiaocui
Kang, Xiaolin
Li, Wanpeng
Wang, Wei
Lai, Zhengxun
Wang, Weijun
Quan, Quan
Bu, Xiuming
Yip, SenPo
Xie, Pengshan
Chen, Dong
Li, Dengji
Wang, Fei
Yeung, Chi-Fung
Lan, Changyong
Liu, Chuntai
Shen, Lifan
Lu, Yang
Chen, Furong
Wong, Chun-Yuen
Ho, Johnny C.
Van der Waals nanomesh electronics on arbitrary surfaces
title Van der Waals nanomesh electronics on arbitrary surfaces
title_full Van der Waals nanomesh electronics on arbitrary surfaces
title_fullStr Van der Waals nanomesh electronics on arbitrary surfaces
title_full_unstemmed Van der Waals nanomesh electronics on arbitrary surfaces
title_short Van der Waals nanomesh electronics on arbitrary surfaces
title_sort van der waals nanomesh electronics on arbitrary surfaces
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10140039/
https://www.ncbi.nlm.nih.gov/pubmed/37105992
http://dx.doi.org/10.1038/s41467-023-38090-8
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