Research on Abrasive Water Jet Polishing of Silicon Carbide Based on Fluid Self-Excited Oscillation Pulse Characteristics

A self-excited oscillating pulsed abrasive water jet polishing method is proposed to solve the problems of low removal efficiency in traditional abrasive water jet polishing and the influence of an external flow field on the material surface removal rate. The self-excited oscillating chamber of the...

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Detalles Bibliográficos
Autores principales: Zhang, Hong, Tao, Baochun, Deng, Qianfa, Zhang, Chengqi, Lyu, Binghai, Nguyen, Duc-Nam
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10140936/
https://www.ncbi.nlm.nih.gov/pubmed/37421086
http://dx.doi.org/10.3390/mi14040852

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10140936/
https://www.ncbi.nlm.nih.gov/pubmed/37421086
http://dx.doi.org/10.3390/mi14040852

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