Cargando…
Modeling of Reactive Sputtering—History and Development
This work critically reviews the evolution of reactive sputtering modeling that has taken place over the last 50 years. The review summarizes the main features of the deposition of simple metal compound films (nitrides, oxides, oxynitrides, carbides, etc.) that were experimentally found by different...
Autor principal: | Shapovalov, Viktor I. |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10145856/ https://www.ncbi.nlm.nih.gov/pubmed/37110092 http://dx.doi.org/10.3390/ma16083258 |
Ejemplares similares
-
Reactive sputter deposition
por: Depla, Diederik, et al.
Publicado: (2008) -
The Effect of Reactive Sputtering on the Microstructure of Parylene-C
por: Raji, Akeem, et al.
Publicado: (2022) -
Electrochemistry of Sputtered Hematite Photoanodes:
A Comparison of Metallic DC versus Reactive RF Sputtering
por: Sinha, Rochan, et al.
Publicado: (2019) -
In situ and real-time monitoring of structure formation during non-reactive sputter deposition of lanthanum and reactive sputter deposition of lanthanum nitride
por: Krause, Bärbel, et al.
Publicado: (2018) -
Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
por: Iqbal, Abid, et al.
Publicado: (2018)