Systematic Studies into the Area Selectivity of Chemical Vapor Deposition Polymerization

[Image: see text] As the current top-down microchip manufacturing processes approach their resolution limits, there is a need for alternative patterning technologies that offer high feature densities and edge fidelity with single-digit nanometer resolution. To address this challenge, bottom-up proce...

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Detalles Bibliográficos
Autores principales: Zhong, Xiaoyang, Jordan, Rob, Chen, Jiun-Ruey, Raymond, Jeffery, Lahann, Joerg
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10165597/
https://www.ncbi.nlm.nih.gov/pubmed/37079371
http://dx.doi.org/10.1021/acsami.3c01268

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10165597/
https://www.ncbi.nlm.nih.gov/pubmed/37079371
http://dx.doi.org/10.1021/acsami.3c01268

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