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Systematic Studies into the Area Selectivity of Chemical Vapor Deposition Polymerization
[Image: see text] As the current top-down microchip manufacturing processes approach their resolution limits, there is a need for alternative patterning technologies that offer high feature densities and edge fidelity with single-digit nanometer resolution. To address this challenge, bottom-up proce...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10165597/ https://www.ncbi.nlm.nih.gov/pubmed/37079371 http://dx.doi.org/10.1021/acsami.3c01268 |