Cargando…

Large-Area Metal–Semiconductor Heterojunctions Realized via MXene-Induced Two-Dimensional Surface Polarization

[Image: see text] Direct MXene deposition on large-area 2D semiconductor surfaces can provide design versatility for the fabrication of MXene-based electronic devices (MXetronics). However, it is challenging to deposit highly uniform wafer-scale hydrophilic MXene films (e.g., Ti(3)C(2)T(x)) on hydro...

Descripción completa

Detalles Bibliográficos
Autores principales: Guo, Tianchao, Xu, Xiangming, Liu, Chen, Wang, Yizhou, Lei, Yongjiu, Fang, Bin, Shi, Lin, Liu, Hang, Hota, Mrinal K., Al-Jawhari, Hala A., Zhang, Xixiang, Alshareef, Husam N.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10173692/
https://www.ncbi.nlm.nih.gov/pubmed/37079914
http://dx.doi.org/10.1021/acsnano.2c12684
_version_ 1785039876861722624
author Guo, Tianchao
Xu, Xiangming
Liu, Chen
Wang, Yizhou
Lei, Yongjiu
Fang, Bin
Shi, Lin
Liu, Hang
Hota, Mrinal K.
Al-Jawhari, Hala A.
Zhang, Xixiang
Alshareef, Husam N.
author_facet Guo, Tianchao
Xu, Xiangming
Liu, Chen
Wang, Yizhou
Lei, Yongjiu
Fang, Bin
Shi, Lin
Liu, Hang
Hota, Mrinal K.
Al-Jawhari, Hala A.
Zhang, Xixiang
Alshareef, Husam N.
author_sort Guo, Tianchao
collection PubMed
description [Image: see text] Direct MXene deposition on large-area 2D semiconductor surfaces can provide design versatility for the fabrication of MXene-based electronic devices (MXetronics). However, it is challenging to deposit highly uniform wafer-scale hydrophilic MXene films (e.g., Ti(3)C(2)T(x)) on hydrophobic 2D semiconductor channel materials (e.g., MoS(2)). Here, we demonstrate a modified drop-casting (MDC) process for the deposition of MXene on MoS(2) without any pretreatment, which typically degrades the quality of either MXene or MoS(2). Different from the traditional drop-casting method, which usually forms rough and thick films at the micrometer scale, our MDC method can form an ultrathin Ti(3)C(2)T(x) film (ca. 10 nm) based on a MXene-introduced MoS(2) surface polarization phenomenon. In addition, our MDC process does not require any pretreatment, unlike MXene spray-coating that usually requires a hydrophilic pretreatment of the substrate surface before deposition. This process offers a significant advantage for Ti(3)C(2)T(x) film deposition on UV-ozone- or O(2)-plasma-sensitive surfaces. Using the MDC process, we fabricated wafer-scale n-type Ti(3)C(2)T(x)–MoS(2) van der Waals heterojunction transistors, achieving an average effective electron mobility of ∼40 cm(2)·V(–1)·s(–1), on/off current ratios exceeding 10(4), and subthreshold swings of under 200 mV·dec(–1). The proposed MDC process can considerably enhance the applications of MXenes, especially the design of MXene/semiconductor nanoelectronics.
format Online
Article
Text
id pubmed-10173692
institution National Center for Biotechnology Information
language English
publishDate 2023
publisher American Chemical Society
record_format MEDLINE/PubMed
spelling pubmed-101736922023-05-12 Large-Area Metal–Semiconductor Heterojunctions Realized via MXene-Induced Two-Dimensional Surface Polarization Guo, Tianchao Xu, Xiangming Liu, Chen Wang, Yizhou Lei, Yongjiu Fang, Bin Shi, Lin Liu, Hang Hota, Mrinal K. Al-Jawhari, Hala A. Zhang, Xixiang Alshareef, Husam N. ACS Nano [Image: see text] Direct MXene deposition on large-area 2D semiconductor surfaces can provide design versatility for the fabrication of MXene-based electronic devices (MXetronics). However, it is challenging to deposit highly uniform wafer-scale hydrophilic MXene films (e.g., Ti(3)C(2)T(x)) on hydrophobic 2D semiconductor channel materials (e.g., MoS(2)). Here, we demonstrate a modified drop-casting (MDC) process for the deposition of MXene on MoS(2) without any pretreatment, which typically degrades the quality of either MXene or MoS(2). Different from the traditional drop-casting method, which usually forms rough and thick films at the micrometer scale, our MDC method can form an ultrathin Ti(3)C(2)T(x) film (ca. 10 nm) based on a MXene-introduced MoS(2) surface polarization phenomenon. In addition, our MDC process does not require any pretreatment, unlike MXene spray-coating that usually requires a hydrophilic pretreatment of the substrate surface before deposition. This process offers a significant advantage for Ti(3)C(2)T(x) film deposition on UV-ozone- or O(2)-plasma-sensitive surfaces. Using the MDC process, we fabricated wafer-scale n-type Ti(3)C(2)T(x)–MoS(2) van der Waals heterojunction transistors, achieving an average effective electron mobility of ∼40 cm(2)·V(–1)·s(–1), on/off current ratios exceeding 10(4), and subthreshold swings of under 200 mV·dec(–1). The proposed MDC process can considerably enhance the applications of MXenes, especially the design of MXene/semiconductor nanoelectronics. American Chemical Society 2023-04-20 /pmc/articles/PMC10173692/ /pubmed/37079914 http://dx.doi.org/10.1021/acsnano.2c12684 Text en © 2023 The Authors. Published by American Chemical Society https://creativecommons.org/licenses/by/4.0/Permits the broadest form of re-use including for commercial purposes, provided that author attribution and integrity are maintained (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Guo, Tianchao
Xu, Xiangming
Liu, Chen
Wang, Yizhou
Lei, Yongjiu
Fang, Bin
Shi, Lin
Liu, Hang
Hota, Mrinal K.
Al-Jawhari, Hala A.
Zhang, Xixiang
Alshareef, Husam N.
Large-Area Metal–Semiconductor Heterojunctions Realized via MXene-Induced Two-Dimensional Surface Polarization
title Large-Area Metal–Semiconductor Heterojunctions Realized via MXene-Induced Two-Dimensional Surface Polarization
title_full Large-Area Metal–Semiconductor Heterojunctions Realized via MXene-Induced Two-Dimensional Surface Polarization
title_fullStr Large-Area Metal–Semiconductor Heterojunctions Realized via MXene-Induced Two-Dimensional Surface Polarization
title_full_unstemmed Large-Area Metal–Semiconductor Heterojunctions Realized via MXene-Induced Two-Dimensional Surface Polarization
title_short Large-Area Metal–Semiconductor Heterojunctions Realized via MXene-Induced Two-Dimensional Surface Polarization
title_sort large-area metal–semiconductor heterojunctions realized via mxene-induced two-dimensional surface polarization
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10173692/
https://www.ncbi.nlm.nih.gov/pubmed/37079914
http://dx.doi.org/10.1021/acsnano.2c12684
work_keys_str_mv AT guotianchao largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT xuxiangming largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT liuchen largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT wangyizhou largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT leiyongjiu largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT fangbin largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT shilin largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT liuhang largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT hotamrinalk largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT aljawharihalaa largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT zhangxixiang largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization
AT alshareefhusamn largeareametalsemiconductorheterojunctionsrealizedviamxeneinducedtwodimensionalsurfacepolarization