Transverse Deflection for Extreme Ultraviolet Pellicles

Defect control of extreme ultraviolet (EUV) masks using pellicles is challenging for mass production in EUV lithography because EUV pellicles require more critical fabrication than argon fluoride (ArF) pellicles. One of the fabrication requirements is less than 500 [Formula: see text] transverse def...

Descripción completa

Detalles Bibliográficos
Autor principal: Kim, Sang-Kon
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10179971/
https://www.ncbi.nlm.nih.gov/pubmed/37176352
http://dx.doi.org/10.3390/ma16093471

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10179971/
https://www.ncbi.nlm.nih.gov/pubmed/37176352
http://dx.doi.org/10.3390/ma16093471

Ejemplares similares