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Transverse Deflection for Extreme Ultraviolet Pellicles
Defect control of extreme ultraviolet (EUV) masks using pellicles is challenging for mass production in EUV lithography because EUV pellicles require more critical fabrication than argon fluoride (ArF) pellicles. One of the fabrication requirements is less than 500 [Formula: see text] transverse def...
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10179971/ https://www.ncbi.nlm.nih.gov/pubmed/37176352 http://dx.doi.org/10.3390/ma16093471 |