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Tailoring Photoprotection of Polylactide with New Isobornyl Derivatives of Phenol and Aniline
This article is devoted to the development of new photostabilizers for polylactide (PLA), a polymer that is an environmentally friendly alternative to polymers and is based on fossil raw materials. We have elucidated the role of the reaction center of two potential PLA photoprotectors: N-isobornylan...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10180735/ https://www.ncbi.nlm.nih.gov/pubmed/37177288 http://dx.doi.org/10.3390/polym15092141 |
Sumario: | This article is devoted to the development of new photostabilizers for polylactide (PLA), a polymer that is an environmentally friendly alternative to polymers and is based on fossil raw materials. We have elucidated the role of the reaction center of two potential PLA photoprotectors: N-isobornylaniline and 2-isobornylphenol, in reactions occurring in a polymer matrix under the action of UV-C radiation. PLA samples with the photostabilizers were irradiated under a wavelength of 253.7 nm for 4, 8 and 12 h. The effectiveness of the photostabilizers was evaluated based on FTIR spectrometric data, (1)H and (13)C NMR, scanning electron microscopy and simultaneous thermal analysis (TG-DSC). Both stabilizers led to the protection of ester bonds between monomer units of PLA. However, 2-isobornylphenol proved to be more effective at a concentration of 0.05 wt.%, while the optimal concentration of N-isobornylaniline was 0.5 wt.% by weight. TG-DSC showed that the addition of N-isobornylaniline led to an increase in PLA resistance to thermal decomposition; the temperature of the onset of weight loss increased by 2.8 °C at 0.05 wt.% and by 8.1 °C at 0.5 wt.% of N-isobornylaniline. The photoprotector 2-isobornylphenol, on the contrary, reduced the thermal stability of PLA. |
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