Coarse-Grained Modeling of EUV Patterning Process Reflecting Photochemical Reactions and Chain Conformations

Enabling extreme ultraviolet lithography (EUVL) as a viable and efficient sub-10 nm patterning tool requires addressing the critical issue of reducing line edge roughness (LER). Stochastic effects from random and local variability in photon distribution and photochemical reactions have been consider...

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Detalles Bibliográficos
Autores principales: Kim, Tae-Yi, Kang, In-Hwa, Park, Juhae, Kim, Myungwoong, Oh, Hye-Keun, Hur, Su-Mi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10180770/
https://www.ncbi.nlm.nih.gov/pubmed/37177136
http://dx.doi.org/10.3390/polym15091988

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10180770/
https://www.ncbi.nlm.nih.gov/pubmed/37177136
http://dx.doi.org/10.3390/polym15091988

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