Cargando…

Modulated wafer-scale WS(2) films based on atomic-layer-deposition for various device applications

Tungsten disulfide (WS(2)) is promising for potential applications in transistors and gas sensors due to its high mobility and high adsorption of gas molecules onto edge sites. This work comprehensively studied the deposition temperature, growth mechanism, annealing conditions, and Nb doping of WS(2...

Descripción completa

Detalles Bibliográficos
Autores principales:	Guo, Xiangyu, Yang, Hanjie, Mo, Xichao, Bai, Rongxu, Wang, Yanrong, Han, Qi, Han, Sheng, Sun, Qingqing, Zhang, David W., Hu, Shen, Ji, Li
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	The Royal Society of Chemistry 2023
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10184003/ https://www.ncbi.nlm.nih.gov/pubmed/37197184 http://dx.doi.org/10.1039/d3ra00933e

Ejemplares similares

Wafer-Scale Synthesis of WS(2) Films with In Situ Controllable p-Type Doping by Atomic Layer Deposition
por: Yang, Hanjie, et al.
Publicado: (2021)

Area-Selective Atomic Layer Deposition of Two-Dimensional WS(2) Nanolayers
por: Balasubramanyam, Shashank, et al.
Publicado: (2020)

Thickness scaling of atomic-layer-deposited HfO(2) films and their application to wafer-scale graphene tunnelling transistors
por: Jeong, Seong-Jun, et al.
Publicado: (2016)

Fabrication of WS(2)/GaN p-n Junction by Wafer-Scale WS(2) Thin Film Transfer
por: Yu, Yang, et al.
Publicado: (2016)

Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process
por: Zhao, Kai, et al.
Publicado: (2022)

Atomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering
por: Cao, Yan-Qiang, et al.
Publicado: (2017)

Edge-Site Nanoengineering of WS(2) by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
por: Balasubramanyam, Shashank, et al.
Publicado: (2019)

Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors
por: Ma, Qian, et al.
Publicado: (2018)

Nano-oxide thin films deposited via atomic layer deposition on microchannel plates
por: Yan, Baojun, et al.
Publicado: (2015)

Atomic layer deposition and tellurization of Ge–Sb film for phase-change memory applications
por: Kim, Yewon, et al.
Publicado: (2019)

Bi-layer Channel AZO/ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition Technique
por: Li, Huijin, et al.
Publicado: (2017)

Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method
por: Lin, Shih-Chin, et al.
Publicado: (2023)

Atomic Layer Deposition of Photoconductive Cu(2)O Thin Films
por: Iivonen, Tomi, et al.
Publicado: (2019)

Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films
por: Madadi, Milad, et al.
Publicado: (2021)

One-step Synthesis of Few-layer WS(2) by Pulsed Laser Deposition
por: Loh, Tamie A. J., et al.
Publicado: (2015)

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
por: Zhai, Chen-Hui, et al.
Publicado: (2016)

New Heteroleptic Germanium Precursors for GeO(2) Thin Films by Atomic Layer Deposition
por: Choi, Heenang, et al.
Publicado: (2023)

Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
por: Kim, Hyo Jin K., et al.
Publicado: (2019)

Atomic layer deposition of superparamagnetic ruthenium-doped iron oxide thin film
por: Tamm, Aile, et al.
Publicado: (2021)

Atomic layer deposition of vanadium oxide films for crystalline silicon solar cells
por: Costals, Eloi Ros, et al.
Publicado: (2021)

Atomic Layer Deposition of Alumina-Coated Thin-Film Cathodes for Lithium Microbatteries
por: O’Donoghue, Aaron, et al.
Publicado: (2023)

Particle atomic layer deposition
por: Weimer, Alan W.
Publicado: (2019)

HfS(2) thin films deposited at room temperature by an emerging technique, solution atomic layer deposition
por: Cao, Yuanyuan, et al.
Publicado: (2021)

The Effect of Film Thickness on the Gas Sensing Properties of Ultra-Thin TiO(2) Films Deposited by Atomic Layer Deposition
por: Wilson, Rachel L., et al.
Publicado: (2018)

Layer-by-layer epitaxy of multi-layer MoS(2) wafers
por: Wang, Qinqin, et al.
Publicado: (2022)

Wafer-Scale Thermophoretic Dry Deposition of Single-Walled Carbon Nanotube Thin Films
por: Laiho, Patrik, et al.
Publicado: (2018)

AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
por: Kao, Wei-Chung, et al.
Publicado: (2019)

Label-free plasmonic-based biosensing using a gold nanohole array chip coated with a wafer-scale deposited WS(2) monolayer
por: Kang, Lixing, et al.
Publicado: (2022)

Wafer-Scale Fabrication of Sub-10 nm TiO(2)-Ga(2)O(3)n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer Deposition
por: Xu, Hongyan, et al.
Publicado: (2019)

Method for Aluminum Oxide Thin Films Prepared through Low Temperature Atomic Layer Deposition for Encapsulating Organic Electroluminescent Devices
por: Li, Hui-Ying, et al.
Publicado: (2015)

Atomic layer deposition, a unique method for the preparation of energy conversion devices
por: Bachmann, Julien
Publicado: (2014)

High-Quality Few-Layer Graphene on Single-Crystalline SiC thin Film Grown on Affordable Wafer for Device Applications
por: Endoh, Norifumi, et al.
Publicado: (2021)

Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
por: Van Toan, Nguyen, et al.
Publicado: (2021)

The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition
por: Wang, Zi-Yi, et al.
Publicado: (2015)

Formation of Micro- and Nanostructures on the Nanotitanium Surface by Chemical Etching and Deposition of Titania Films by Atomic Layer Deposition (ALD)
por: Nazarov, Denis V., et al.
Publicado: (2015)

Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures
por: Ren, Fang-Bin, et al.
Publicado: (2022)

Room-temperature bonding of Al(2)O(3) thin films deposited using atomic layer deposition
por: Takakura, Ryo, et al.
Publicado: (2023)

Effects of doping and annealing on properties of ZnO films grown by atomic layer deposition
por: Wang, Aiji, et al.
Publicado: (2015)

Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
por: Tamm, Aile, et al.
Publicado: (2017)

Chemically Stable Atomic-Layer-Deposited Al(2)O(3) Films for Processability
por: Broas, Mikael, et al.
Publicado: (2017)

Cannot write session to /tmp/vufind_sessions/sess_ffc0dav654mnq7s5eiv1ftau52