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Infrared sensitive mixed phase of V(7)O(16) and V(2)O(5) thin-films

We report an infrared (IR) sensitive mixed phase of V(7)O(16) and V(2)O(5) thin films, grown by cathodic vacuum arc-deposition on glass substrates at relatively low temperatures. We have found that the mixed phase of V(7)O(16) and V(2)O(5) can be stabilized by post-annealing of amorphous V(x)O(y) be...

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Detalles Bibliográficos
Autores principales: Rana, Anchal, Yadav, Aditya, Gupta, Govind, Rana, Abhimanyu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10201198/
https://www.ncbi.nlm.nih.gov/pubmed/37223643
http://dx.doi.org/10.1039/d3ra00752a
Descripción
Sumario:We report an infrared (IR) sensitive mixed phase of V(7)O(16) and V(2)O(5) thin films, grown by cathodic vacuum arc-deposition on glass substrates at relatively low temperatures. We have found that the mixed phase of V(7)O(16) and V(2)O(5) can be stabilized by post-annealing of amorphous V(x)O(y) between 300–400 °C, which gets fully converted into V(2)O(5) after annealing at higher temperatures ∼450 °C. The local conversion from V(x)O(y) to V(2)O(5) has also been demonstrated by applying different laser powers in Raman spectroscopy measurements. The optical transmission of these films increases as the content of V(2)O(5) increases but the electrical conductivity and the optical bandgap decrease. These results are explained by the role of defects (oxygen vacancies) through the photoluminescence (PL) and time-resolved photoluminescence (TRPL) measurements. The IR sensitivity of the mixed phase is explained by the plasmonic absorption by the V(7)O(16) degenerate semiconductor.