Design and Measurement of Microelectromechanical Three-Axis Magnetic Field Sensors Based on the CMOS Technique

The design, fabrication, and measurement of a microelectromechanical system (MEMS) three-axis magnetic field sensor (MFS) based on the commercial complementary metal oxide semiconductor (CMOS) process are investigated. The MFS is a magnetic transistor type. The performance of the MFS was analyzed em...

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Detalles Bibliográficos
Autores principales: Wu, Chi-Han, Hsu, Cheng-Chih, Tsai, Yao-Chuan, Lee, Chi-Yuan, Dai, Ching-Liang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10222463/
https://www.ncbi.nlm.nih.gov/pubmed/37241663
http://dx.doi.org/10.3390/mi14051038

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10222463/
https://www.ncbi.nlm.nih.gov/pubmed/37241663
http://dx.doi.org/10.3390/mi14051038

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