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Low-Fluorescence Starter for Optical 3D Lithography of Sub-40 nm Structures
[Image: see text] Stimulated emission depletion (STED) has been used to break the diffraction limit in fluorescence microscopy. Inspired by this success, similar methods were used to reduce the structure size in three-dimensional, subdiffractional optical lithography. So far, only a very limited num...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10226181/ https://www.ncbi.nlm.nih.gov/pubmed/37255503 http://dx.doi.org/10.1021/acsaom.3c00031 |