Wafer defect recognition method based on multi-scale feature fusion

Wafer defect recognition is an important process of chip manufacturing. As different process flows can lead to different defect types, the correct identification of defect patterns is important for recognizing manufacturing problems and fixing them in good time. To achieve high precision identification of wafer defects and improve the quality and production yield of wafers, this paper proposes a Multi-Feature Fusion Perceptual Network (MFFP-Net) inspired by human visual perception mechanisms. The MFFP-Net can process information at various scales and then aggregate it so that the next stage can abstract features from the different scales simultaneously. The proposed feature fusion module can obtain higher fine-grained and richer features to capture key texture details and avoid important information loss. The final experiments show that MFFP-Net achieves good generalized ability and state-of-the-art results on real-world dataset WM-811K, with an accuracy of 96.71%, this provides an effective way for the chip manufacturing industry to improve the yield rate.