Laser maskless fast patterning for multitype microsupercapacitors

Downsizing electrode architectures have significant potential for microscale energy storage devices. Asymmetric micro-supercapacitors play an essential role in various applications due to their high voltage window and energy density. However, efficient production and sophisticated miniaturization of asymmetric micro-supercapacitors remains challenging. Here, we develop a maskless ultrafast fabrication of multitype micron-sized (10 × 10 μm(2)) micro-supercapacitors via temporally and spatially shaped femtosecond laser. MXene/1T-MoS(2) can be integrated with laser-induced MXene-derived TiO(2) and 1T-MoS(2)-derived MoO(3) to generate over 6,000 symmetric micro-supercapacitors or 3,000 asymmetric micro-supercapacitors with high-resolution (200 nm) per minute. The asymmetric micro-supercapacitors can be integrated with other micro devices, thanks to the ultrahigh specific capacitance (220 mF cm(−2) and 1101 F cm(−3)), voltage windows in series (52 V), energy density (0.495 Wh cm(−3)) and power density (28 kW cm(−3)). Our approach enables the industrial manufacturing of multitype micro-supercapacitors and improves the feasibility and flexibility of micro-supercapacitors in practical applications.