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Comprehensive Investigation of Constant Voltage Stress Time-Dependent Breakdown and Cycle-to-Breakdown Reliability in Y-Doped and Si-Doped HfO(2) Metal-Ferroelectric-Metal Memory
In this study, we comprehensively investigate the constant voltage stress (CVS) time-dependent breakdown and cycle-to-breakdown while considering metal-ferroelectric-metal (MFM) memory, which has distinct domain sizes induced by different doping species, i.e., Yttrium (Y) (Sample A) and Silicon (Si)...
Autores principales: | Chang, Ting-Yu, Wang, Kuan-Chi, Liu, Hsien-Yang, Hseun, Jing-Hua, Peng, Wei-Cheng, Ronchi, Nicolò, Celano, Umberto, Banerjee, Kaustuv, Van Houdt, Jan, Wu, Tian-Li |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10386612/ https://www.ncbi.nlm.nih.gov/pubmed/37513115 http://dx.doi.org/10.3390/nano13142104 |
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